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Reseach Article

A Low Power 90nm Technology based CMOS Digital Gates with Dual Threshold Transistor Stacking Technique

by P. S. Aswale, S. S. Chopade
International Journal of Computer Applications
Foundation of Computer Science (FCS), NY, USA
Volume 59 - Number 11
Year of Publication: 2012
Authors: P. S. Aswale, S. S. Chopade
10.5120/9596-4215

P. S. Aswale, S. S. Chopade . A Low Power 90nm Technology based CMOS Digital Gates with Dual Threshold Transistor Stacking Technique. International Journal of Computer Applications. 59, 11 ( December 2012), 47-52. DOI=10.5120/9596-4215

@article{ 10.5120/9596-4215,
author = { P. S. Aswale, S. S. Chopade },
title = { A Low Power 90nm Technology based CMOS Digital Gates with Dual Threshold Transistor Stacking Technique },
journal = { International Journal of Computer Applications },
issue_date = { December 2012 },
volume = { 59 },
number = { 11 },
month = { December },
year = { 2012 },
issn = { 0975-8887 },
pages = { 47-52 },
numpages = {9},
url = { https://ijcaonline.org/archives/volume59/number11/9596-4215/ },
doi = { 10.5120/9596-4215 },
publisher = {Foundation of Computer Science (FCS), NY, USA},
address = {New York, USA}
}
%0 Journal Article
%1 2024-02-06T21:03:58.514002+05:30
%A P. S. Aswale
%A S. S. Chopade
%T A Low Power 90nm Technology based CMOS Digital Gates with Dual Threshold Transistor Stacking Technique
%J International Journal of Computer Applications
%@ 0975-8887
%V 59
%N 11
%P 47-52
%D 2012
%I Foundation of Computer Science (FCS), NY, USA
Abstract

Scaling of transistor features sizes has improves performance, increase transistor density and reduces the power consumption. A chip's maximum power consumption depends on its technology as well as its implementation. As technology scales down and CMOS circuits are powered by lower supply voltages, leakage current becomes significant. static power is becoming the predominant source of energy waste. To create methodologies that support efficient designs, good performance, lower costs in the era of low power, is up to the design, EDA community . As the threshold voltage is reduced due to scaling, it leads to increase in sub threshold leakage current and hence increase in static power dissipation. This paper presents performance analysis of inverter using conventional CMOS, stack and dual threshold transistor stacking techniques. The performance analysis of inverter were analyzed in 90nm technology using Cadence virtuoso environment. The use of dual threshold voltages can significantly reduce static power dissipated in CMOS VLSI circuits.

References
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Index Terms

Computer Science
Information Sciences

Keywords

CMOS inverter static power threshold voltage transistor stacking ULSI. ifx