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Physical Properties of Nanostructured Fese Thin Films Deposited by Chemical Bath Deposition Techniques: Effect of Fe(NO3)3. 9H2O Source

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IJCA Proceedings on International Conference on Benchmarks in Engineering Science and Technology 2012
© 2012 by IJCA Journal
ICBEST - Number 3
Year of Publication: 2012
Authors:
Yogesh S. Sakhare
Monali V. Bhute
Milind R. Belkhedkar
S. G. Ibrahim
Ashok U. Ubale

Yogesh S Sakhare, Monali V Bhute, Milind R Belkhedkar, S G Ibrahim and Ashok U Ubale. Article: Physical Properties of Nanostructured Fese Thin Films Deposited by Chemical Bath Deposition Techniques: Effect of Fe(NO3)3.9H2O Source. IJCA Proceedings on International Conference on Benchmarks in Engineering Science and Technology 2012 ICBEST(3):11-14, October 2012. Full text available. BibTeX

@article{key:article,
	author = {Yogesh S. Sakhare and Monali V. Bhute and Milind R. Belkhedkar and S. G. Ibrahim and Ashok U. Ubale},
	title = {Article: Physical Properties of Nanostructured Fese Thin Films Deposited by Chemical Bath Deposition Techniques: Effect of Fe(NO3)3.9H2O Source},
	journal = {IJCA Proceedings on International Conference on Benchmarks in Engineering Science and Technology 2012},
	year = {2012},
	volume = {ICBEST},
	number = {3},
	pages = {11-14},
	month = {October},
	note = {Full text available}
}

Abstract

The simple, economic and convenient chemical bath deposition technique is utilized to grow nanostructured FeSe thin films at room temperature. The effect of Fe ion source, Fe (NO3)3. 9H20 on growth process of FeSe thin films is discussed. The X-ray diffraction study revealed that the CBD deposited FeSe thin films are polycrystalline in nature with hexagonal type lattice. The morphological investigations carried from SEM and AFM analysis shows that FeSe grains are uniformly distributed over the entire substrate surface. The electrical resistivity of FeSe films is of the order of 104?-cm. The thermo-emf measurements confirms its P-type conductivity.

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