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Reseach Article

Computational Modeling of Nanoscale Droplet Deposition Phenomena

Published on February 2013 by Salil Desai, Ravindra Kaware
International Conference on Recent Trends in Information Technology and Computer Science 2012
Foundation of Computer Science USA
ICRTITCS2012 - Number 1
February 2013
Authors: Salil Desai, Ravindra Kaware
54f54de5-a3e1-435a-82b4-3027f333630c

Salil Desai, Ravindra Kaware . Computational Modeling of Nanoscale Droplet Deposition Phenomena. International Conference on Recent Trends in Information Technology and Computer Science 2012. ICRTITCS2012, 1 (February 2013), 1-6.

@article{
author = { Salil Desai, Ravindra Kaware },
title = { Computational Modeling of Nanoscale Droplet Deposition Phenomena },
journal = { International Conference on Recent Trends in Information Technology and Computer Science 2012 },
issue_date = { February 2013 },
volume = { ICRTITCS2012 },
number = { 1 },
month = { February },
year = { 2013 },
issn = 0975-8887,
pages = { 1-6 },
numpages = 6,
url = { /proceedings/icrtitcs2012/number1/10243-1302/ },
publisher = {Foundation of Computer Science (FCS), NY, USA},
address = {New York, USA}
}
%0 Proceeding Article
%1 International Conference on Recent Trends in Information Technology and Computer Science 2012
%A Salil Desai
%A Ravindra Kaware
%T Computational Modeling of Nanoscale Droplet Deposition Phenomena
%J International Conference on Recent Trends in Information Technology and Computer Science 2012
%@ 0975-8887
%V ICRTITCS2012
%N 1
%P 1-6
%D 2013
%I International Journal of Computer Applications
Abstract

This research investigates nanoscale droplet deposition phenomena towards developing nanomanufacturing processes. The deposition and spreading behavior of water nanodroplet on SiO2 and Si3N4 substrates is studied using molecular dynamics simulation. The effect of temperature variations on the dynamic contact angle during the wetting phenomena is observed. SiO2 and Si3N4 substrates reveal a hydrophilic and hydrophobic interaction with water, respectively. An experimental design is conducted to observe the effect of substrate type and temperature on the time to reach equilibrium contact angle. Both factors and their interaction have a statistical significant effect on the equilibration time. The results of this research form a basis to predict wetting behavior for aqueous colloids on different substrates towards nanoscale manufacturing.

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Index Terms

Computer Science
Information Sciences

Keywords

Computational Modeling Nanotechnology Nanodroplet Nanomanufacturing Statistical Analysis Substrate Deposition